• 专利附录
  • 专利说明
  • 权利要求
  • 类似技术
  • 同族专利
  • 引用文献
  • 法律状态
  • 优先权
    • 专利摘要:
    The invention relates to a device (1) for measuring particles, in particular their concentrations, in a gas phase, wherein at least one particle sensor arrangement (4) is provided, wherein a flow channel (2) is provided, through which the gas phase can be guided, wherein the particle sensor arrangement (4) has at least one sensor which is positioned to measure a gas phase flowing through the flow channel (2). In addition, the invention relates to a use of such a device (1) for measuring particle concentrations in a gas phase. Furthermore, the invention relates to a method for measuring particles, in particular their concentrations, in a gas phase, by means of such a device (1), wherein the, in particular particle-carrying, gas phase through a flow channel (2) is guided, the particles in the gas phase, at least partially, in particular targeted to at least one particle sensor assembly (4) are guided with at least one sensor and at least one physical variable, for example a change of at least one temperature and / or vibration by means of at least one sensor is measured.
    公开号:AT519716A1
    申请号:T50204/2017
    申请日:2017-03-14
    公开日:2018-09-15
    发明作者:
    申请人:Mat Center Leoben Forschung Gmbh；
    IPC主号:
    专利说明:

    Summary
    The invention relates to a device (1) for measuring particles, in particular their
    Concentrations, in a gas phase, at least one particle sensor arrangement (4) being provided, a flow channel (2) being provided through which the gas phase can be passed, the particle sensor arrangement (4) having at least one sensor which is used to measure one through the flow channel (2) flowing gas phase is positioned.
    The invention also relates to the use of such a device (1) for measuring particle concentrations in a gas phase.
    The invention also relates to a method for measuring particles, in particular their concentrations, in a gas phase by means of such a device (1), the gas phase, in particular carrying particles, being passed through a flow channel (2), the particles in the gas phase, be guided at least partially, in particular in a targeted manner, to at least one particle sensor arrangement (4) with at least one sensor and at least one physical variable, for example a change in at least one temperature and / or a vibration, is measured by means of the at least one sensor.
    Fig. 1a
    1/28
    Particle sensor and method for measuring particle concentrations
    The invention relates to a device for measuring particles, in particular their concentrations, in a gas phase, at least one particle sensor arrangement being provided.
    The invention further relates to the use of such a device.
    Furthermore, the invention relates to a method for measuring particles, in particular their concentrations, in a gas phase with a device, in particular a device of the type mentioned at the beginning.
    Devices for detecting particle concentrations in a gas phase are known from the prior art. Known measuring systems are, for example, resistive particle sensors which measure a change in conductivity when particles accumulate on the sensors. In addition, measuring systems are known which are based on piezo crystals, whereby particles also have to accumulate on the sensors. Furthermore, optical measuring systems are known which use light scattering on particles in a gas phase to determine the particle concentration.
    The disadvantage of such devices is, on the one hand, that at least partial accumulation of particles occurs during a measurement, which makes regeneration of the particle sensors complex or shortens the life of the particle sensors.
    On the other hand, a complex and expensive structure, such as an optical system with a light source, may be necessary. The influence of larger particles on the measurement result is often high compared to smaller particles.
    The object of the invention is therefore to provide a compact, inexpensive to manufacture and almost maintenance-free particle sensor for the sensitive and reliable measurement of at least one particle concentration, in which a cleaning or regeneration effort is reduced.
    28.2
    Another object of the invention is a use for an inventive
    Specify device.
    Another object of the invention is to provide a sensitive, reliable method for
    Specify measurement of at least one particle concentration with which a cleaning effort of the particle sensor used is minimized.
    The object is achieved according to the invention in that in a device of the type mentioned at the outset there is a flow channel through which the gas phase can be passed, the particle sensor arrangement having at least one sensor which is positioned for measuring a gas phase flowing through the flow channel. The gas phase can carry particles such as fine dust (e.g. PM 10 , PM2.5), ultra fine dust, etc.
    An advantage achieved with the device according to the invention can be seen in particular in the fact that a gas phase carrying particles can be guided directly past the particle sensor arrangement through the flow channel. This enables a compact, in particular miniaturized structure and the device does not have to, but can be designed as part of a larger flow system.
    It can be provided that at least one particle sensor arrangement is positioned in the region of the flow channel, preferably in and / or on the flow channel. The particle sensor arrangement is particularly preferably positioned on the inside on the flow channel. With a very compact design, this ensures that a gas phase carrying particles inevitably flows past the particle sensor arrangement. Alternatively, the particle sensor arrangement can then be positioned at one end of the flow channel.
    It is advantageous if sensors are used as at least one particle sensor arrangement
    Heating elements, in particular as heating elements with at least one temperature sensor, preferably each with a temperature sensor, are formed. The temperature sensor is preferably integrated directly in the heating element. This ensures that heating elements can be brought to a certain temperature, a change in the temperature of the heating element can be measured and / or the temperature of the heating element
    3/28 can be kept constant. It is also advantageous if the temperature of each individual heating element can be measured separately and appropriate means are provided for this. The heating elements of a particle sensor arrangement can vary in size and, for example, as micro heating plates or nano heating elements, such as
    Nanowires. The temperature sensor can be designed, for example, as a thermocouple or thermocouple, diode, etc.
    It can be advantageous if sensors from at least one particle sensor arrangement each have at least one nanowire. Nanowires can be caused to vibrate, for example, by impinging particles, which can subsequently be measured, for example using a piezoelectric effect. Alternatively, an electrical conductivity of the nanowire can also be measurable.
    In order to measure particle concentrations as a function of the particle size, it is advantageous if sensors of the particle sensor arrangement are arranged as an array, preferably as a linear array, the sensors preferably being arranged on a chip. On the one hand, the sensors can be arranged in a row and, on the other hand, several such rows, for example in parallel. Arranging the sensors on a chip makes it particularly compact, in particular miniaturized
    Construction allows.
    In order to lead a fluid, for example a gas phase, through the flow channel, it is advantageous if at least one fluid acceleration means is provided. The at least one fluid acceleration means can, for example, before and / or after the
    Flow channel may be arranged. Alternatively, at least one
    Fluid acceleration means can be positioned in and / or on the flow channel. A fluid accelerator can be, for example, a blower, a fan or the like.
    The at least one fluid acceleration means is particularly preferred as
    Heating device, wherein the heating device has at least one heating element and preferably a temperature sensor, wherein the at least one heating element is preferably arranged on a chip. For example, the heating device can heat up the gas phase in the flow channel, in particular its
    4.28
    Accelerate gas particles and / or gas molecules, which creates thermal convection and the gas phase, following a chimney effect, flows through the flow channel. A temperature sensor can be provided in order to keep the heating element or elements at a constant temperature, wherein a heating power required for this can be measured, or, for example with a constant heating power, to measure a change in temperature of the heating element or elements. Alternatively, a targeted change in temperature, for example a temperature ramp, can also be generated, it being possible to measure the power required for this. In principle, any increase in power, for example a steady, a stepwise or a sawtooth increase, can be generated for this. Is particularly preferred for everyone
    Heating element each provided a temperature sensor. By arranging the heating elements on a chip, the heating device can be made particularly compact, in particular miniaturized. The heating device can, for example, be designed similarly or identically to the particle sensor arrangement, with a higher operating temperature being provided for the heating device. Heating elements can be designed, for example, as micro heating plates.
    It is advantageous if at least one deflection device is provided, at least one deflection device being positioned in the region of the flow channel, particularly preferably in and / or on the flow channel. Such a deflection device can be provided in order to direct the gas phase and / or particles in the gas phase onto the particle sensor arrangement. A deflection device can be designed, for example, as a guide element, such as a plate arranged obliquely in the flow channel. Alternatively or in addition, a device for
    Generation of an electrostatic field can be provided for the deflection of particles.
    Particularly preferably, at least one deflection device is positioned opposite at least one particle sensor arrangement, as a result of which the gas phase and / or particles in the gas phase are applied in a simple manner
    Particle sensor arrangement is steerable. Such a deflection device can be designed, for example, as a heating device. This can result in a temperature gradient in the flow channel, the particles in the gas phase being deflected onto the particle sensor arrangement by means of thermophoresis.
    5.28
    In order not to slow down a flow velocity, it is advantageous if a first opening of the flow channel has an at least equally large, in particular larger, cross-sectional area than a second opening. It can be provided, for example, that a flow channel is continuously and / or gradually tapered in the flow direction. A direction of flow is defined here from the first opening to the second opening, the gas phase flowing in through the first opening and the gas phase flowing out through the second opening. The particles are carried along by the gas phase.
    In order to prevent particles from being deposited, it can be provided that the at least one particle sensor arrangement at least partially has a coating, for example a non-stick coating. In addition, the flow channel and / or the heating device can also have a non-stick coating. It can be advantageous if the adhesive effect of such a coating is temperature-dependent. For the measurement, the coating can accordingly be brought to a temperature at which an adhesive effect is increased and particles adhere to the particle sensor arrangement. For regeneration, the coating can be brought to a different temperature at which an adhesive effect is reduced and particles detach from the particle sensor arrangement. In the second case, the coating serves as a non-stick coating. To avoid electrophoretic effects, the
    Coating can also be designed as an anti-electrostatic coating. Such a coating can also be provided in addition to another coating. The temperature can be set, for example, with heating elements or with at least one cooling device, for example a Peltier element. In order to ensure a continuous measurement, provision can also be made for pairs of sensors to be provided, for example, in each case one sensor being regenerated and one sensor in a measuring mode. Alternatively, two particle sensor arrangements can also be provided, one each
    Particle sensor arrangement is regenerated while the other is in the measuring mode.
    It is advantageous if at least one control unit is provided for controlling the heating elements. As a result, heating elements of the heating device and / or of the particle sensor arrangement can be kept at a constant temperature and / or operated at constant power. A heat emission to an environment is here
    6/28 depends on the particle concentration, which is why a change in the temperature of the heating elements depends on the particle concentration when operating at constant power. The control unit can also comprise a readout and / or evaluation unit or be connected to a readout and / or evaluation unit in order to
    To be able to react to measurement results or to adjust a heating output accordingly.
    The further aim of the invention is achieved when using a device according to the invention for measuring particle concentrations in a gas phase.
    The further object of the invention is achieved in a method of the type mentioned at the outset in that the gas phase, in particular particle-carrying, is passed through a flow channel, the particles in the gas phase, at least partially, in particular directed to at least one particle sensor arrangement with at least one
    Sensor are guided and at least one physical variable, for example a change in at least one temperature and / or a vibration is measured by means of the at least one sensor. A measurement can be based on various measurement principles, such as a surface acoustic wave measurement (SAW) or a film bulk wave resonator (FBAR). Alternatively, the measurement can be carried out as a capacitive or electrostatic measurement. Another way of
    Measuring a physical quantity consists in using a piezoelectric effect.
    An advantage achieved with the method according to the invention can be seen in particular in that there is no deposition of particles on the at least one sensor or other parts of a device used for the measurement.
    It is advantageous if the at least one sensor of the at least one particle sensor arrangement is heated to a temperature lower than 200 ° C., in particular to a temperature between 50 ° C. and 150 ° C., particularly preferably to approximately 100 ° C.
    The at least one sensor of the particle sensor arrangement is particularly preferably heated or heated with at least temporarily constant power. This makes it possible
    7/28 that a sensor temperature or a temperature of the heating elements of the particle sensor arrangement changes depending on the particle concentration. If, for example, particles hit a sensor, it cools down because a heating power remains constant while heat is dissipated to the particles. Such a change in temperature can be measured. The particle concentration can be determined from the change in temperature. In the case of pulsed operation or operation with at least temporarily constant power, for example, a heating element can be heated with a constant power for a certain period of time, or heated at intervals. Alternatively, the heating element can also have a stepped shape
    Power increase are heated, with the power being kept constant on each level.
    In order to cause thermophoresis or thermal diffusion of the particles, it is advantageous if at least one heating device is at a higher temperature than the at least one particle sensor arrangement, for example at least 200 ° C., in particular to a temperature in the range from 230 ° C. to 400 ° C. , preferably to a temperature in the range from 250 ° C to 350 ° C, particularly preferably to about 300 ° C. If the heater is at a higher temperature than that
    Has particle sensor arrangement, a temperature gradient extends from the
    Heating device for the particle sensor arrangement, wherein a thermophoretic effect occurs along this temperature gradient and deflects particles in the gas phase in the direction of the particle sensor arrangement.
    In order to be able to measure particle concentrations depending on size, it is advantageous if
    Signals from a plurality of sensors can be read out separately from one another. For example, temperatures of the individual sensors or heating elements can be read out and analyzed. Accordingly, a particle concentration for each individual sensor and subsequently a concentration of the particles in the gas phase can be determined depending on the size of the particles in the gas phase.
    In order to remove deposited particles from the particle sensor arrangement, it is advantageous if, for cleaning the particle sensors, heating elements of the particle sensors are brought to at least 200 ° C., in particular to a temperature in the range from 250 ° C. to 400 ° C., particularly preferably to 300 ° C. , If this is the case
    8.28
    If the heating device is not in operation or is brought to a temperature lower than 200 ° C., the thermophoretic effect is reversed, as a result of which particles are guided away from the particle sensor arrangement. Alternatively, high temperatures can be set on the particle sensor arrangement in order to detach particles from the sensor surface or to burn particles. In addition, a device for sensor cooling, for example a Peltier element, can be provided.
    The invention is explained in more detail below. In the drawings, to which reference is made, show:
    1a shows a cross section of a device according to the invention;
    1b shows a cross section of an alternative embodiment;
    1c shows a further alternative embodiment of a device;
    2 shows a schematic illustration of a flow channel;
    3a shows a schematic illustration of a heating element;
    3b shows a further embodiment of a heating element;
    3c shows a further embodiment of a heating element;
    3d shows a cross-sectional illustration of a heating element;
    4 is a photograph of a chip;
    Fig. 5 is a schematic representation of possible modes of a change in performance.
    1 a shows a cross section through a device 1 according to the invention. The device 1 comprises a flow channel 2, a heating device 3 and a particle sensor arrangement 4, at least one element 21 forming a flow channel. 1a also shows an optional deflection device, which is shown in dashed lines and can be designed, for example, as an elevation 31. Such a deflection device can, depending on the type and / or mode of operation, be arranged at different positions in the flow channel 2. A function of the deflection device can be mechanical, for example, by an elevation 31, a
    Depression and / or a baffle plate is provided, which a flow of
    Deflects gas phase. Alternatively, the functioning of the deflection device can be based on other effects, such as a thermophoretic effect. For this purpose, the heating device 3 can serve as a deflection device. In this embodiment, a first opening 5 has a larger cross-sectional area than a second opening 6. The two
    28.9
    Openings 5, 6 have a rectangular cross-sectional area. A side length, in particular a shorter side length, of the first opening 5 can in principle be of any design, preferably less than 20 mm, in particular 3 mm to 5 mm. One side length, especially a shorter side length of the second
    Opening 6 of the flow channel 2 can in principle be of any design, preferably less than 10 mm, in particular 1 mm to 2 mm. In the case of a round shape of the openings 5, 6, this side length corresponds in each case to the diameter of the openings 5, 6. A gas phase, for example ambient air carrying particles, can enter the flow channel 2 through the first opening 5. For this purpose, it can be provided that the first opening 5 is connected to an environment via a flow control system, for example pipes and / or hoses, as a result of which the gas phase can be tracked or sucked in from the environment, for example laterally and / or from above. In the further course, at another end of the flow channel 2, the gas phase can emerge again through the second opening 6
    Exit flow channel 2. A direction of flow generally runs from the first opening 5 to the second opening 6. The direction of flow is preferably vertical, but can also be horizontal, in particular if the flow channel 2 is part of a larger flow system. The height of the flow channel 2 can in principle be arbitrary, preferably less than 50 mm, in particular 10 mm to 25 mm.
    In the area of the heating device 3, a temperature gradient arises between the heating device 3 and the particle sensor arrangement 4, as a result of which the particles in the gas phase are subject to a thermophoretic effect. As a result, the heating device 3 acts as a deflection device for the particles. A movement of the particles in the gas phase is in
    1a indicated by arrows, particles with a large diameter essentially following a short arrow, while particles with a small diameter essentially following a long arrow. The length of the arrows is accordingly related to the diameter of the particles. The average diameter of the particles is typically between 0.1 pm and 5 pm. Thermophoresis therefore deflects large particles more than small particles. This results in a size distribution of the particles in
    Flow direction, which is why in such a device 1 the particle concentrations can be measured depending on the size. For this purpose, it is advantageous if the particle sensor arrangement 4 is designed as a linear array, the individual sensors being arranged along the flow direction. It is advisable
    10/28 if the sensors are arranged in a row, whereby several rows can be arranged side by side. Accordingly, larger particles become on sensors which are positioned closer to the first opening 5 and smaller particles on sensors which are further away from the first opening 5 and closer to the second
    Opening 6 are directed.
    In one embodiment shown in FIG. 1b, the flow channel 2 is designed as a silicon via (through-silicon via). With such an approach, in which a plurality of substrates, preferably silicon wafers, are stacked one above the other, a device 1 on a wafer scale can be provided. The flow channel 2 can have a diameter in the submillimeter range, for example between 10 pm and 250 pm, in particular approximately 80 pm. In such a device 1 on a wafer scale, a height of the flow channel 2 is significantly reduced; for example, the height is on the order of a silicon wafer, such as 1 mm or less.
    In this exemplary embodiment, the cross-sectional areas of the first opening 5 and the second opening 6 are essentially of the same size. To produce such a flow channel 2, silicon vias can be etched into at least one layer of silicon. In addition, several layers of silicon can be stacked one above the other in order to form a longer flow channel 2. Furthermore, one
    Heating device 3 and a particle sensor arrangement 4 are provided, which can also be applied to or attached to a layer of silicon. The heating device 3 and the particle sensor arrangement 4 are designed in size and shape such that a gas phase in the flow channel 2 can flow around them. For this purpose, the heating device 3 and the particle sensor arrangement 4 can comprise, for example, heating plates 7 or bars 11 as shown in FIGS. 3a to c. In the exemplary embodiment shown in FIG. 1b, the temperature gradient between the heating device 3 and the particle sensor arrangement 4 runs from bottom to top along the flow direction of the gas phase, for which reason the particles cannot be separated according to size.
    In an embodiment shown in FIG. 1c, the flow channel 2 likewise comprises silicon vias, in particular silicon vias of different diameters. Here, the flow channel 2 comprises three sections, a first section with the third section through the second section
    11/28 is connected. The first and third sections are essentially of the same design and have approximately the same diameter. However, the silicon vias of the first and third sections are positioned offset from one another. The flow direction is vertical in these sections. The second section includes a larger diameter silicon via. The flow direction is horizontal in this section. The heating device 3 and the particle sensor arrangement 4 are positioned in the second section, opposite one another and horizontally. The temperature gradient is essentially perpendicular to the direction of flow, which is why the particles can be separated.
    In order to enable size separation by means of thermophoresis, it is generally necessary for the heating device 3 and the particle sensor arrangement 4 to be positioned on different side surfaces of the flow channel 2, preferably on opposite side surfaces of the flow channel 2, in particular approximately opposite one another. Furthermore, it is advantageous if the temperature gradient crosses the direction of flow, that is if the temperature gradient and the direction of flow do not run parallel. The temperature gradient is particularly preferably approximately perpendicular to the direction of flow. The one described here
    Embodiment represents a minimal configuration for size separation. Of course, a device 1 can comprise any combination of at least one heating device 3 and at least one particle sensor arrangement 4.
    Otherwise, the embodiments shown in FIGS. 1a to c can be oriented or rotated as desired, as a result of which a flow direction deviates from a horizontal or vertical.
    FIG. 2 shows a schematic representation of an embodiment of a flow channel 2. The flow channel 2 can alternatively also be part of a larger flow system, it being possible for a gas phase emerging via the flow channel 2 to be replenished from an environment of the flow channel 2.
    12.28
    3a shows a schematic representation of an embodiment of a heating element 7, a recess 8 being etched onto a substrate 12. A heating plate 9 is arranged approximately centrally above the depression 8. The depression 8 can extend completely through the substrate 12, for example, after which one
    Particle sensor arrangement 4 or a heating element 3 as shown in FIG. 1b can be provided. A heating plate 9 can for example be designed as a heating resistor. For example, electrical current can be passed through the heating plate 9. In addition, a resistance of the heating plate 9 can be measured. The heating plate 9 shown in Fig. 3a is square, but other shapes, e.g. be rectangular, polygonal or round or oval.
    The heating plates 9 of a heating device 3 can be designed as micro heating plates and have a side length of less than 500 pm, in particular approximately 5 pm to 100 pm. A thickness of such a heating plate 9 can be less than 50 pm, in particular approximately 0.5 pm to 10 pm. Furthermore, such a heating plate 9 is connected to feed arms 10. The feed arms 10 can, for example, have a length of more than 5 pm, in particular 10 pm to 300 pm and a width of less than 100 pm, in particular 5 pm to 50 pm. A thickness of the feed arms 10 can be less than 50 pm, in particular approximately 0.5 to 10 pm. The heating plates 9 of a heating device 3 can each have different sizes, ie not all heating plates 9 of a heating device 3 have to be of the same size.
    The same applies to heating plates 9 of a particle sensor arrangement 4. In addition, heating plates 9 of the particle sensor arrangement 4 can be designed significantly smaller than heating plates 9 of the heating device 3, for example as nano-heating elements, such as nanowires, electrical current being passed through these nano-heating elements and optionally an electrical resistance can be measured. Heating plates 9 can be formed at least partially from a semiconductor material such as silicon, a metal oxide, for example zinc oxide, copper oxide or tungsten oxide and / or from a metal such as platinum. The temperature sensors can be of the same order of magnitude as the heating plates 9 or feed arms 10.
    Alternatively, as shown in FIG. 3b, only two feed arms 10 to the heating plate 9 can also be provided. As in FIG. 3b, two feed arms 10 can enclose an angle of 180 °. Of course, two feed arms 10 can also be another
    13/28
    Include angles, such as an angle of about 90 °. It is also conceivable for any number of feed arms 10 to be provided.
    Alternatively, a dimension of the hot plate 9 may be the same as that of FIG
    Inlet arms 10 be. This results in a continuous bar 11. Such a bar 11 is shown in FIG. 3c. Of course, several such bars 11 can also be provided. Several bars 11 are preferably arranged parallel to one another. Beams 11 of this type can have different dimensions, that is to say in width, length and thickness, but in particular can be designed like feed arms 10.
    Bars 11 can particularly preferably be formed as nanowire, with a width and / or thickness in the submicron range, in particular between 10 nm and 500 nm. Nanowires can, for example, be transferred to the substrate 12 or to the heating plate 9 via a transfer process, for example by deposition or oxidation. It can also be provided that the heating plate 9 has electrodes, wherein, for example, a nanowire can be arranged between two electrodes in each case. In this way, for example, an electrical resistance between the electrodes and thus, for example, a temperature effect can be measured. The nanowires are preferably formed at least partially from metal oxides, for example from zinc oxide.
    As an alternative to the straight-line feed arms 10 and / or beams 11 shown in FIGS.
    FIG. 3d shows a heating element 7 in a cross-sectional representation, a recess 8 being etched into the substrate 12 and a continuous bar 11 being arranged above it.
    Heating elements 7, as shown in FIGS. 3a to d, can be provided in a particle sensor arrangement 4 and / or in a heating device 3.
    In the heating device 3, heating elements 7 are kept at a constant temperature, preferably at 300 ° C., in order to lead the gas phase through the flow channel 2 and / or around one, for example by means of thermal convection
    To generate temperature gradients. For this purpose, the heating device 3 can be operated, for example, with more than 1 mW, preferably 5 mW to 20 mW, in particular with approximately 10 mW
    14/28, whereby an output is adjusted in this way and adjusted in the course of a measurement in order to keep a desired temperature constant. The heating elements 7 can be operated uniformly, for example with direct current, or in a pulsed manner.
    When the particle sensor arrangement 4 is operated uniformly, heating elements 7 are operated with a constant output, for example with 1 mW or more, and brought to a specific temperature, an output being adapted in such a way that a desired measurement temperature, for example 100 ° C., is reached. In the course of the measurement e.g. the performance kept constant. A change in temperature can be detected using temperature sensors. The particle concentration can then be determined from the change in temperature.
    5 shows possible modes when the heating elements 7 are in operation. If, for example, the power is to be kept constant over the course of the measurement, this can be done, as in FIG
    Section 14 or 15 is shown, pulsed or continuous. If the power is to be changed over the course of the measurement, this can also be done in a pulsed manner, as shown in section 16, the temperature being kept constant for a certain time. Alternatively, a change in performance over the course of the measurement can occur continuously, as shown in section 17. The respective sections can be of any length and can be combined as desired during and / or between different measurements. Individual pulses can also be of any length. In addition, a pause between each two pulses can be of any length and, in particular, can also be omitted, as a result of which the power is changed in steps. When operating with a changeable temperature or when operating with different temperature cycles, for example, an influence of the
    Environment, such as the influence of a moisture of the gas phase or a different composition of the gas phase can be determined, whereby the measurement of the particle concentration can be corrected. This can, for example, increase the precision of the measurement. A change in performance is not limited to the modes shown in FIG. 5, but may follow another shape, such as a sawtooth shape.
    During a pulsed operation of the particle sensor arrangement 4, the heating elements 7 are heated up quickly, for example within 20 ms, to, for example, 200 ° C. To
    15/28 a predetermined time, typically after a few seconds, the
    Heating elements 7 switched off again. A heating-up time and a cooling-down time each depend on the heat given off to the environment and thus on the particle concentration.
    Therefore, a slope and a form of heating curves and / or
    Cooling curves the particle concentration can be determined.
    In another embodiment, heating elements 7 with a bar 11 configured as nanowire can be provided in the particle sensor arrangement 4. The particle concentration can also be determined by changing the
    Temperature. Alternatively, the nanowire can be vibrated by impinging particles. The particle concentration can be determined using a piezoelectric effect.
    For cleaning purposes, heating elements 7 of the particle sensor arrangement 4 can be brought to a constant temperature, for example 300 ° C., which is higher than in a measuring operation. For this purpose, heating elements 7 can be operated as in the heating device 3.
    4 shows a photograph of a chip 13 with a CMOS-integrated array of eight
    Heating elements 7. Such a chip 13 can have a side length of 5 mm, for example.
    In one embodiment, for example, a learning phase or a calibration of the device 1 can also be provided in order to increase the precision of the measurement. In order to implement a differential measurement, several devices 1, for example on a multi-sensor plate, can also be provided.
    16/28
    权利要求:
    Claims (24)
    [1]
    claims
    1. Device (1) for measuring particles, in particular their concentrations, in a gas phase, at least one particle sensor arrangement (4) being provided, characterized in that a flow channel (2) is provided through which the gas phase can be passed, the Particle sensor arrangement (4) has at least one sensor which is positioned for measuring a gas phase flowing through the flow channel (2).
    [2]
    2. Device (1) according to claim 1, characterized in that at least one particle sensor arrangement (4) is positioned in the region of the flow channel (2), preferably in and / or on the flow channel (2).
    [3]
    3. Device (1) according to claim 1 or 2, characterized in that sensors of at least one particle sensor arrangement (4) are designed as heating elements (7), in particular as heating elements (7) with at least one temperature sensor, preferably each with a temperature sensor.
    [4]
    4. Device (1) according to one of claims 1 to 3, characterized in that sensors of at least one particle sensor arrangement (4) each have at least one nanowire.
    [5]
    5. Device (1) according to one of claims 1 to 4, characterized in that sensors of the particle sensor arrangement (4) are arranged as an array, preferably as a linear array, the sensors being preferably arranged on a chip (13).
    [6]
    6. Device (1) according to one of claims 1 to 5, characterized in that at least one fluid acceleration means is provided.
    [7]
    7. The device (1) according to claim 6, characterized in that the at least one fluid acceleration means is designed as a heating device (3), the heating device (3) having at least one heating element (7) and preferably a temperature sensor, the at least one heating element ( 7) is preferably arranged on a chip (13).
    17/28
    [8]
    8. Device (1) according to one of claims 1 to 7, characterized in that at least one deflection device is provided, at least one deflection device being positioned in the region of the flow channel (2), particularly preferably in and / or on the flow channel (2).
    [9]
    9. The device (1) according to claim 8, characterized in that at least one deflection device is positioned opposite at least one particle sensor arrangement (4).
    [10]
    10 10. Device (1) according to one of claims 1 to 9, characterized in that a first opening (5) of the flow channel (2) has an at least the same, in particular larger cross-sectional area than a second opening (6).
    [11]
    11. The device (1) according to any one of claims 1 to 10, characterized in that
    15 the at least one particle sensor arrangement (4) at least partially has a coating, for example a non-stick coating.
    [12]
    12. The device (1) according to one of claims 1 to 11, characterized in that at least one control unit for controlling the heating elements (7) is provided.
    [13]
    13. Use of a device (1) according to one of claims 1 to 12, for measuring particle concentrations in a gas phase.
    [14]
    14. Method for measuring particles, in particular their concentrations, in one
    25 gas phase with a device (1), in particular a device (1) according to one of the
    Claims 1 to 12, characterized in that the gas phase, in particular carrying particles, is guided through a flow channel (2), the particles in the gas phase being guided, at least partially, in particular in a targeted manner to at least one particle sensor arrangement (4) with at least one sensor and at least
    30 a physical quantity, for example a change in at least one temperature and / or a vibration is measured by means of the at least one sensor.
    [15]
    15. The method according to claim 14, characterized in that the at least one sensor of the at least one particle sensor arrangement (4) to a lower temperature
    18/28 as 200 ° C, in particular to a temperature between 50 ° C and 150 ° C, particularly preferably to about 100 ° C.
    [16]
    16. The method according to claim 14 or 15, characterized in that the at least
    5 a sensor of the particle sensor arrangement (4) is heated or heated with at least temporarily constant power.
    [17]
    17. The method according to any one of claims 14 to 16, characterized in that at least one heating device (3) to a higher temperature than the at least one
    10 particle sensor arrangement (4), for example to at least 200 ° C, in particular to a temperature in the range from 230 ° C to 400 ° C, preferably to a temperature in the range from 250 ° C to 350 ° C, particularly preferably to about 300 ° C brought.
    [18]
    18. The method according to any one of claims 14 to 17, characterized in that
    15 signals from a plurality of sensors can be read out separately from one another.
    [19]
    19. The method according to any one of claims 14 to 18, characterized in that for cleaning the particle sensor arrangement (4) heating elements (7) of the particle sensor arrangement (4) to at least 200 ° C, in particular to a temperature in
    [20]
    20 range from 250 ° C to 400 ° C, particularly preferably brought to 300 ° C.
    19/28
    1.5
    20/28
    2.5
    Fig. 1b
    [21]
    21/28
    3.5
    Fig. 2
    [22]
    22/28
    4.5
    FS
    B 9S X ga B Ä g λ ga "
    Fig. 3b
    [23]
    23/28
    5.5
    [24]
    24/28
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    同族专利:
    公开号 | 公开日
    AT519716B1|2019-01-15|
    EP3596445A1|2020-01-22|
    KR20190127679A|2019-11-13|
    JP2020510821A|2020-04-09|
    WO2018165689A1|2018-09-20|
    引用文献:
    公开号 | 申请日 | 公开日 | 申请人 | 专利标题
    US20130036793A1|2011-08-08|2013-02-14|University Of California|Microfabricated particulate matter monitor|
    WO2016198321A1|2015-06-12|2016-12-15|Koninklijke Philips N.V.|Particle sensor and particle sensing method|
    US7168292B2|2003-05-15|2007-01-30|The Regents Of The University Of California|Apparatus for particulate matter analysis|US20190145871A1|2017-11-14|2019-05-16|Aerodyne Microsystems Inc., a Delaware Corporation|Airborne particle detection with selective thermophoretic particle deflection|
    法律状态:
    优先权:
    申请号 | 申请日 | 专利标题
    ATA50204/2017A|AT519716B1|2017-03-14|2017-03-14|Particle sensor and method for measuring particle concentrations|ATA50204/2017A| AT519716B1|2017-03-14|2017-03-14|Particle sensor and method for measuring particle concentrations|
    KR1020197023149A| KR20190127679A|2017-03-14|2018-03-13|Particle sensor and its method for measuring particulate concentration|
    JP2019544063A| JP2020510821A|2017-03-14|2018-03-13|Particle sensor and method for measuring particle concentration|
    EP18714424.1A| EP3596445A1|2017-03-14|2018-03-13|Particle sensor and method for measuring particle concentrations|
    PCT/AT2018/060064| WO2018165689A1|2017-03-14|2018-03-13|Particle sensor and method for measuring particle concentrations|
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